Improve Uniformity of Thermal Oxide Films
November 30, 2011
A steam purification company has developed a product for specialty applications in the semiconductor and photovoltaic industries.
The Steamer Turbo from Rasirc, San Diego, uses integrated gas-blending control, solving the common problem of condensation when blending steam with compressed gases. It delivers high flow rates of steam combined with nitrogen or oxygen, which can improve the uniformity of thermal oxide films and provide better momentum for particle removal after condensation.
"Initial results indicate the ability to reduce process times for thin thermal oxidations," says Jeffrey Spiegelman, president. "Other emerging applications include wafer cleaning in semiconductor processing and inline oxidation and emitter drive-in for the solar industry."
The Turbo integrates high flows of high temperature nitrogen with 50 slm of steam delivered repeatable to ±1 percent, Spiegelman says.