A seminar on complying with Miscellaneous Organic NESHAP (MON) rule will be held at the 2005 Chem Show, which is scheduled for November 1-3 at the Javitz Convention Center, New York. The rule, which affects manufacturers of organic chemicals in batch or continuous processes, states that any HAP emission more than five tons per year that is not addressed by previous MACT regulation must be controlled by November 2006.

At the seminar, scheduled for the morning of November 1, Kevin Summ of Anguil Environmental Systems will present three technologies currently in operation on similar applications. These include:

  • A 30,000 scfm three-chamber regenerative thermal oxidizer and downstream acid gas scrubber for 99.5 percent VOC/HAP oxidation and HCI removal.

  • A 35,000 scfm two-chamber regenerative thermal oxidizer and downstream acid gas scrubber for 98 percent VOC/HAP oxidation and 99 percent HCl removal.

  • A 1,500 scfm recuperative thermal oxidizer and scrubber for 99.5 percent VOC/HAP oxidation and 99 percent HCl and Cl2 removal.

    The deadline is for the installation and startup of VOC/HAP controls with 98 percent destruction level and nearly 100 percent abatement uptime. It will affect batch chemical process vents, continuous process vents, solvent storage vents and wastewater treatment vents.